Enhanced surface sensitivity in secondary ion mass spectrometric analysis of organic thin films using size-selected Ar gas-cluster ion projectiles
| Autor: | Motohiro Tanaka, Kousuke Moritani, Kozo Mochiji, Noriaki Toyoda, Isao Yamada, Norio Inui, Tomokazu Hirota |
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| Rok vydání: | 2010 |
| Předmět: |
Argon
Ion beam Siloxanes Chemistry Surface Properties Photoelectron Spectroscopy Organic Chemistry Analytical chemistry chemistry.chemical_element Spectrometry Mass Secondary Ion Analytical Chemistry Ion Secondary ion mass spectrometry X-ray photoelectron spectroscopy Sputtering Benzene Derivatives Astrophysics::Solar and Stellar Astrophysics Irradiation Thin film Spectroscopy |
| Zdroj: | Rapid communications in mass spectrometry : RCM. 24(10) |
| ISSN: | 1097-0231 |
| Popis: | A size-selected argon (Ar) gas-cluster ion beam (GCIB) was applied to the secondary ion mass spectrometry (SIMS) of a 1,4-didodecylbenzene (DDB) thin film. The samples were also analyzed by SIMS using an atomic Ar+ ion projectile and X-ray photoelectron spectroscopy (XPS). Compared with those in the atomic-Ar+ SIMS spectrum, the fragment species, including siloxane contaminants present on the sample surface, were enhanced several hundred times in the Ar gas-cluster SIMS spectrum. XPS spectra during beam irradiation indicate that the Ar GCIB sputters contaminants on the surface more effectively than the atomic Ar+ ion beam. These results indicate that a large gas-cluster projectile can sputter a much shallower volume of organic material than small projectiles, resulting in an extremely surface-sensitive analysis of organic thin films. Copyright © 2010 John Wiley & Sons, Ltd. |
| Databáze: | OpenAIRE |
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