Cavity-hollow cathode-sputtering source for titanium films

Autor: I. Vojvodic, C. Maszl, G. B. Rusu, Roman Schrittwieser, A. Murawski, Paul Scheier, Claire Douat, S. Jaksch, Mihai Asandulesa, Codrina Ionita, Marius Dobromir, A. V. Nastuta, Dumitru Luca, S. Olenici
Přispěvatelé: 'Petru Poni' Institute of Macromolecular Chemistry, Université Paris-Sud - Paris 11 (UP11), 'Alexandru Ioan Cuza' University of Iasi - Faculty of Physics, Department of Plasma Physics, Optics and Spectroscopy and Structure of Matter, Institut für Ionenphysik und Angewandte Physik - Institute for Ion Physics and Applied Physics [Innsbruck], Leopold Franzens Universität Innsbruck - University of Innsbruck
Rok vydání: 2010
Předmět:
Zdroj: Journal of Plasma Physics
Journal of Plasma Physics, Cambridge University Press (CUP), 2010, 76 (3-4), ⟨10.1017/S0022377809990900⟩
ISSN: 1469-7807
0022-3778
DOI: 10.1017/s0022377809990900
Popis: A cavity-hollow cathode was investigated as low-cost sputtering source for titanium. An argon discharge is produced inside a hollow cathode consisting of two specifically formed disks of titanium. An additional cavity further enhances the pendulum effect of the electrons. Measurements with small Langmuir probes yielded evidence for the formation of a space charge double layer above the cathode. The sputtered atoms form negatively charged clusters. After further acceleration by the double layer the clusters impinge on the substrates. Titanium thin films were produced on highly oriented pyrolytic graphite. The films were investigated by a scanning tunnel microscope and X-ray photoelectron spectroscopy.
Databáze: OpenAIRE