Characterization of Wet Chemistry Resist and Resist Residues Removal Processes

Autor:	Pekka Savolahti, Ismo Luusua, Teija Häkkinen, Arto Kiviranta, Simo Eränen, Tarja Riihisaari, Esa Muukkonen
Rok vydání:	1999
Předmět:	Metal contamination Optics Materials science Resist Chemical engineering business.industry Light scattering measurement Condensed Matter Physics business Mathematical Physics Atomic and Molecular Physics and Optics Wet chemistry Analysis method
Zdroj:	Muukkonen, E, Häkkinen, T, Riihisaari, T, Eränen, S, Luusua, I, Kiviranta, A & Savolahti, P 1999, ' Characterization of wet chemistry resist and resist residues removal processes ', Physica Scripta, vol. T79, pp. 255-258 . https://doi.org/10.1238/Physica.Topical.079a00255
ISSN:	0031-8949
DOI:	10.1238/physica.topical.079a00255
Popis:	Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c6288099d8b2a2e113c4ce2bd0bd0301 https://doi.org/10.1238/physica.topical.079a00255 Zobrazit plný text záznamu