Fabry-Perot-type antireflective coating for deep-ultraviolet binary photomask applications
| Autor: | Tiao Yuan Huang, Hsuen-Li Chen, Chien Kui Hsu, Tieh Chi Chu, Fu-Hsiang Ko |
|---|---|
| Rok vydání: | 2002 |
| Předmět: |
Materials science
business.industry Materials Science (miscellaneous) Industrial and Manufacturing Engineering law.invention Optics Anti-reflective coating Stack (abstract data type) law Optoelectronics Business and International Management Thin film Photomask Photolithography business Layer (electronics) Lithography Fabry–Pérot interferometer |
| Zdroj: | Applied Optics. 41:3961 |
| ISSN: | 1539-4522 0003-6935 |
| DOI: | 10.1364/ao.41.003961 |
| Popis: | We demonstrate an antireflective coating structure, which is based on the three-layer metal interference called the Fabry-Perot structure, for a deep-ultraviolet binary mask. The antireflective coating structure is composed of a metal-oxide-metal stack. By addition of different optimized structures, reflectances of less than 1.5% at both 248 and 193 nm have been achieved. At the three-layer Fabry-Perot structure, the bottom chrome layer provides suitable absorption. By controlling the thickness of the intermediate silicon oxide layer, we can tune the minimum-reflection regime to the desired exposure wavelength. The top metal layer can prevent charge accumulation during e-beam writing. |
| Databáze: | OpenAIRE |
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