Comparison of Analytical Methods for Residue Detection of Resist Removal Processes

Autor:	E. Muukkonen, Jari Tuominen, Tarja Riihisaari, S. Lehto, T. Lindblom, Simo Eränen, Arto Kiviranta, J. Likonen
Rok vydání:	1998
Předmět:	Residue (complex analysis) Materials science Resist P and T-GC/MS General Materials Science Nanotechnology AFM Condensed Matter Physics SIMS Atomic and Molecular Physics and Optics
Zdroj:	Solid State Phenomena. :215-218
ISSN:	1662-9779
DOI:	10.4028/www.scientific.net/ssp.65-66.215
Popis:	In integrated circuits fabrication photoresist layers are used as a pattern definition in etching and as a mask in ion implantation. Since photoresist layers are only used as an intermediate step and are not incorporated in the final structure, photoresist layers need to be thoroughly removed from the wafer surface. In this work we have evaluated the use of different on-line and off-line analytical methods for the detection of process residues of photoresist removal.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c5d33ff44ee35569901143bf021f45c4 https://doi.org/10.4028/www.scientific.net/ssp.65-66.215 Zobrazit plný text záznamu