Electron beam irradiation for the formation of thick Ag film on Ag3PO4
| Autor: | Vinícius Teodoro, João Paulo Carmo, Marcelo Assis, Andre Rodrigues, Miguel A. San-Miguel, Juan Andrés, João Paulo de Campos da Costa, Elson Longo, Camila Cristina de Foggi |
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| Rok vydání: | 2020 |
| Předmět: |
Diffraction
Materials science business.industry Scanning electron microscope General Chemical Engineering Analytical chemistry 02 engineering and technology General Chemistry 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences Metal symbols.namesake Semiconductor X-ray photoelectron spectroscopy visual_art symbols visual_art.visual_art_medium Surface modification Irradiation 0210 nano-technology business Raman spectroscopy |
| Zdroj: | Repositori Universitat Jaume I Universitat Jaume I |
| ISSN: | 2046-2069 |
| Popis: | This study demonstrates that the electron beam irradiation of materials, typically used in characterization measurements, could be employed for advanced fabrication, modification, and functionalization of composites. We developed irradiation equipment using an electron beam irradiation source to be applied in materials modification. Using this equipment, the formation of a thick Ag film on the Ag3PO4 semiconductor is carried out by electron beam irradiation for the first time. This is confirmed by various experimental techniques (X-ray diffraction, field-emission scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy) and ab initio molecular dynamics simulations. Our calculations demonstrate that, at the earlier stages, metallic Ag growth is initiated preferentially at the (110) surface, with the reduction of surface Ag cations forming metallic Ag clusters. As the (100) and (111) surfaces have smaller numbers of exposed Ag cations, the reductions on these surfaces are slower and are accompanied by the formation of O2 molecules. |
| Databáze: | OpenAIRE |
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