The atom pencil: serial writing in the sub-micrometre domain
| Autor: | Dieter Meschede, U. Rasbach, B. Viaris de Lesegno, Colm O'Dwyer, G. Georgiev, D. Haubrich, K. Ludolph, M. Müller, Egbert Oesterschulze, John Weiner, M. Mützel |
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| Rok vydání: | 2005 |
| Předmět: |
Quantum optics
Materials science Physics and Astronomy (miscellaneous) Microscale Physics::Instrumentation and Detectors business.industry Aperture General Engineering Nanometer scale General Physics and Astronomy Collimated light Pencil (optics) Photoionization and excitation Optics Nanolithography Ultracold atom Atom lithography Laser cooling Atom Physics::Atomic Physics business Lithography Atomic nanofabrication |
| Zdroj: | Applied Physics B. 80:941-944 |
| ISSN: | 1432-0649 0946-2171 |
| DOI: | 10.1007/s00340-005-1863-9 |
| Popis: | The atom pencil we describe here is a versatile tool that writes arbitrary structures by atomic deposition in a serial lithographic process. This device consists of a transversely laser-cooled and collimated cesium atomic beam that passes through a 4-pole atom-flux concentrator and impinges on to micron- and sub-micron-sized apertures. The aperture translates above a fixed substrate and enables the writing of sharp features with sizes down to 280 nm. We have investigated the writing and clogging properties of an atom pencil tip fabricated from silicon oxide pyramids perforated at the tip apex with a sub-micron aperture. |
| Databáze: | OpenAIRE |
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