Tunable Radiation Response in Hybrid Organic–Inorganic Gate Dielectrics for Low-Voltage Graphene Electronics
| Autor: | Mark C. Hersam, Cory D. Cress, Scott W. Schmucker, Rajan Kumar, Julian J. McMorrow, Kyle A. Luck, Kanan Puntambekar, Laila Jaber-Ansari, Heather N. Arnold, Tobin J. Marks, Vinod K. Sangwan |
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| Rok vydání: | 2016 |
| Předmět: |
Materials science
business.industry Graphene Transistor Gate dielectric 02 engineering and technology Dielectric 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Flexible electronics 0104 chemical sciences law.invention Semiconductor law Absorbed dose Optoelectronics General Materials Science Field-effect transistor 0210 nano-technology business |
| Zdroj: | ACS Applied Materials & Interfaces. 8:5058-5064 |
| ISSN: | 1944-8252 1944-8244 |
| DOI: | 10.1021/acsami.5b12259 |
| Popis: | Solution-processed semiconductor and dielectric materials are attractive for future lightweight, low-voltage, flexible electronics, but their response to ionizing radiation environments is not well understood. Here, we investigate the radiation response of graphene field-effect transistors employing multilayer, solution-processed zirconia self-assembled nanodielectrics (Zr-SANDs) with ZrOx as a control. Total ionizing dose (TID) testing is carried out in situ using a vacuum ultraviolet source to a total radiant exposure (RE) of 23.1 μJ/cm(2). The data reveal competing charge density accumulation within and between the individual dielectric layers. Additional measurements of a modified Zr-SAND show that varying individual layer thicknesses within the gate dielectric tuned the TID response. This study thus establishes that the radiation response of graphene electronics can be tailored to achieve a desired radiation sensitivity by incorporating hybrid organic-inorganic gate dielectrics. |
| Databáze: | OpenAIRE |
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