Wetting properties of titanium oxides, oxynitrides and nitrides obtained by DC and pulsed magnetron sputtering and cathodic arc evaporation
| Autor: | Bojan Jokanović, Anka Trajkovska Petkoska, Božana Čolović, Danilo Kisić, Ilija Nasov, Zlatko Rakočević, Vukoman Jokanović |
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| Jazyk: | angličtina |
| Rok vydání: | 2019 |
| Předmět: |
Materials science
chemistry.chemical_element wettability titanium oxide 02 engineering and technology Nitride 010402 general chemistry 01 natural sciences Nanomaterials chemistry.chemical_compound lcsh:TA401-492 General Materials Science magnetron sputtering Mechanical Engineering Metallurgy Sputter deposition 021001 nanoscience & nanotechnology Condensed Matter Physics Evaporation (deposition) Titanium nitride 0104 chemical sciences Titanium oxide titanium nitride chemistry Mechanics of Materials lcsh:Materials of engineering and construction. Mechanics of materials Wetting 0210 nano-technology arc evaporation Titanium |
| Zdroj: | Materials Science-Poland, Vol 37, Iss 2, Pp 173-181 (2019) Materials Science-Poland |
| Popis: | Thin films of titanium oxides, titanium oxynitrides and titanium nitrides were deposited on glass substrates by the methods of direct current (DC) and pulsed magnetron sputtering and cathodic arc evaporation. Phase analysis of the deposited films by X-ray diffraction (XRD) and Fourier-transform infrared spectroscopy (FT-IR) showed the presence of phases with various Ti oxidative states, which indicated a high concentration of oxygen vacancies. The films morphology was investigated by scanning electron microscopy (SEM). Investigations of the films wettability, either with water or ethylene glycol, showed that it depends directly on the concentration of oxygen vacancies. The wettability mechanism was particularly discussed. |
| Databáze: | OpenAIRE |
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