Monte-Carlo simulation and experimental study of the effect of internal charging on the electron emission yield of amorphous SiO$_2$ thin films

Autor: Q. Gibaru, C. Inguimbert, M. Belhaj, M. Raine, D. Lambert
Přispěvatelé: ONERA / DPHY, Université de Toulouse [Toulouse], ONERA-PRES Université de Toulouse, DAM Île-de-France (DAM/DIF), Direction des Applications Militaires (DAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
Jazyk: angličtina
Rok vydání: 2022
Předmět:
Zdroj: Journal of Electron Spectroscopy and Related Phenomena
Journal of Electron Spectroscopy and Related Phenomena, 2022, 261, pp.147265. ⟨10.1016/j.elspec.2022.147265⟩
ISSN: 0368-2048
Popis: International audience; A Monte-Carlo code has been developed for the transport of low energy electrons and the simulation of the internal charge buildup induced by the electron irradiation in thin films of amorphous SiO$_2$. The code is validated with time resolved experimental Electron Emission Yield (EEY) data on 20 nm SiO$_2$ thin films for incident electrons of 300 eV and 1 keV. As the EEY is greater than 1, this corresponds to the case of positive charging. In order to assess the impact of the charge buildup on the electron emission yield, the samples have been negatively polarized to suppress the positive external charging effects, and irradiated with a defocused beam (mm²). A direct correlation is found between the value of the EEY and the density of holes created in the material. This clearly shows that the recombination of the secondary electrons with trapped holes significantly affects the EEY of insulators.
Databáze: OpenAIRE