The preparation of flat H–Si(111) surfaces in 40% NH4F revisited
| Autor: | Danial D. M. Wayner, Sylvie Morin, Catherine Henry de Villeneuve, Rabah Boukherroub, Philippe Allongue |
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| Přispěvatelé: | Université Pierre et Marie Curie - Paris 6 (UPMC), Laboratoire de physique de la matière condensée (LPMC), École polytechnique (X)-Centre National de la Recherche Scientifique (CNRS), Institut de Recherche Interdisciplinaire [Villeneuve d'Ascq] (IRI), Université de Lille, Sciences et Technologies-Université de Lille, Droit et Santé-Centre National de la Recherche Scientifique (CNRS), Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF) |
| Jazyk: | angličtina |
| Rok vydání: | 2000 |
| Předmět: |
Yield (engineering)
Silicon Atomic force microscopy business.industry General Chemical Engineering Analytical chemistry chemistry.chemical_element [CHIM.MATE]Chemical Sciences/Material chemistry Electrochemistry Oxygen Isotropic etching silicon surface Optics chemistry Etching (microfabrication) etching [CHIM]Chemical Sciences Wafer Mechanism AFM business Flat H-Si(111) surface |
| Zdroj: | Electrochimica Acta Electrochimica Acta, 2000, 45 (28), pp.4591-4598. ⟨10.1016/S0013-4686(00)00610-1⟩ |
| ISSN: | 0013-4686 |
| DOI: | 10.1016/S0013-4686(00)00610-1⟩ |
| Popis: | The reasons why ideally flat H–Si(111) surface can be prepared by NH 4 F etching are investigated from correlation between AFM observations and experimental conditions used for etching. It is shown that pitting may be completely suppressed if a one side polished wafer is immersed in an oxygen free solution. An analytical electrochemical study of the (111) and rough face of the same n-Si wafer is presented to yield insight into observations. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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