Microstructure related photoluminescence in a-CNx films deposited by reactive rf magnetron sputtering
Autor: | Michael Lejeune, Ph. Lavallard, C. Barthou, H. J. von Bardeleben, O. Durand-Drouhin, Andreas Zeinert |
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Přispěvatelé: | Laboratoire d'optique des solides (LOS), Université Pierre et Marie Curie - Paris 6 (UPMC)-Centre National de la Recherche Scientifique (CNRS), Groupe de Physique des Solides (GPS), Université Paris Diderot - Paris 7 (UPD7)-Centre National de la Recherche Scientifique (CNRS) |
Jazyk: | angličtina |
Rok vydání: | 2004 |
Předmět: |
Materials science
Photoluminescence Luminescence Thin films Analytical chemistry 02 engineering and technology 01 natural sciences chemistry.chemical_compound 0103 physical sciences Materials Chemistry Thin film Carbon nitride 010302 applied physics Optical properties 61.43.Dq 71.55.Jv 78.55.−m General Chemistry Sputter deposition 021001 nanoscience & nanotechnology Condensed Matter Physics Microstructure Disordered systems chemistry Cathode sputtering 0210 nano-technology Intensity (heat transfer) |
Zdroj: | Solid State Communications Solid State Communications, Elsevier, 2004, 129 (2), pp.107. ⟨10.1016/j.ssc.2003.09.022⟩ Solid State Communications, 2004, 129 (2), pp.107. ⟨10.1016/j.ssc.2003.09.022⟩ |
ISSN: | 0038-1098 |
DOI: | 10.1016/j.ssc.2003.09.022⟩ |
Popis: | Solid State Communications - Vol. 129, P. 107; International audience; We investigated the photoluminescence (PL) properties of carbon nitride films (CNx) deposited by rf magnetron sputtering and compared them to their microstructure depending on the target self-bias. While many of the data are compatible with ‘a-C:H like' PL properties the observed variation of the PL efficiency η with respect to the target bias cannot be easily explained by the standard models. It is suggested that the observed variation of η is rather dominated by a change in microstructure which depends on the bombardment intensity during growth than by the concentration of non-radiative centres. |
Databáze: | OpenAIRE |
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