Adsorption Process of Metastable Molecular Oxygen on a Si(111)-(7x7) Surface

Autor:	Shozo Suto, Wakio Uchida, Toshiaki Ohta, Kenichi Ohno, Han Woong Yeom, Satoshi Doi, Kazuyuki Sakamoto, Yoshimitsu Ushimi
Jazyk:	angličtina
Rok vydání:	1999
Předmět:	Adsorption Materials science Annealing (metallurgy) Metastability Atomic oxygen Dangling bond Physical chemistry Molecular orbital Molecular oxygen Molecular physics Ultraviolet photoelectron spectroscopy
Zdroj:	Physical review. B. 60(12):R8465-R8468
ISSN:	1098-0121 0163-1829
Popis:	The adsorption process of metastable molecular oxygen on a Si~111!-(737) surface is studied by ultraviolet photoelectron spectroscopy. At 120 K, three metastable states at 2.1, 3.8, and 5.1 eV grow up simultaneously following the decrease of the back-bond state as the dosage increases. After annealing at 600 K, we observed an unusual state attributed to the dangling bond. These results and the symmetries of the molecular orbitals lead to a conclusion that the metastable molecular species is adsorbed on top of an adatom stabilized by a coadsorbed atomic oxygen into the back bond. @S0163-1829~99!51636-6#
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c182b56ec18e52c311fcf54cd79507fb http://hdl.handle.net/10097/35431 Zobrazit plný text záznamu