Flexible and Micropatternable Triplet–Triplet Annihilation Upconversion Thin Films for Photonic Device Integration and Anticounterfeiting Applications
| Autor: | Won-Sik Han, Anna L. Hagstrom, Jae-Hyuk Kim, Joori Jung, Hyun-Seok Choe, Jongsoo Ko, Myung-Soo Lee, Hak-Lae Lee, Byung-Geon Park, Jae-Hong Kim |
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| Rok vydání: | 2018 |
| Předmět: |
chemistry.chemical_classification
Flexibility (engineering) Materials science Absorption spectroscopy business.industry Nanotechnology 02 engineering and technology Material Design Polymer 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Soft lithography Photon upconversion 0104 chemical sciences chemistry General Materials Science Thin film Photonics 0210 nano-technology business |
| Zdroj: | ACS Applied Materials & Interfaces. 10:8985-8992 |
| ISSN: | 1944-8252 1944-8244 |
| DOI: | 10.1021/acsami.7b17789 |
| Popis: | Triplet-triplet annihilation upconversion (TTA-UC) has recently drawn widespread interest for its capacity to harvest low-energy photons and to broaden the absorption spectra of photonic devices, such as solar cells. Although conceptually promising, effective integration of TTA-UC materials into practical devices has been difficult due to the diffusive and anoxic conditions required in TTA-UC host media. Of the solid-state host materials investigated, rubbery polymers facilitate the highest TTA-UC efficiency. To date, however, their need for long-term oxygen protection has limited rubbery polymers to rigid film architectures that forfeit their intrinsic flexibility. This study introduces a new multilayer thin-film architecture, in which scalable solution processing techniques are employed to fabricate flexible, photostable, and efficient TTA-UC thin films containing layers of oxygen barrier and host polymers. This breakthrough material design marks a crucial advance toward TTA-UC integration within rigid and flexible devices alike. Moreover, it introduces new opportunities in unexplored applications such as anticounterfeiting. Soft lithography is incorporated into the film fabrication process to pattern TTA-UC host layers with a broad range of high-resolution microscale designs, and superimposing host layers with customized absorption, emission, and patterning ultimately produces proof-of-concept anticounterfeiting labels with advanced excitation-dependent photoluminescent security features. |
| Databáze: | OpenAIRE |
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