Microscale Patterning of Electrochromic Polymer Films via Soft Lithography
| Autor: | Seokwon Joo, Ju-Hyung Kim, Kyoung-Hwan Kim, Tae Soup Shim, Da-Seul Kim, Jae-Yeong Jung, Soonmin Seo |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2018 |
| Předmět: |
chemistry.chemical_classification
Fabrication Materials science Polymers and Plastics Polydimethylsiloxane Article Subject Nanotechnology 02 engineering and technology Polymer lcsh:Chemical technology 010402 general chemistry 021001 nanoscience & nanotechnology Elastomer 01 natural sciences Soft lithography 0104 chemical sciences chemistry.chemical_compound chemistry Electrochromism lcsh:TP1-1185 Dewetting 0210 nano-technology Contact print |
| Zdroj: | International Journal of Polymer Science, Vol 2018 (2018) |
| ISSN: | 1687-9422 |
| DOI: | 10.1155/2018/6365096 |
| Popis: | We present a direct fabrication technique of patterned polymeric electrochromic (EC) devices via soft lithography, enabling both negative patterning and positive patterning of the polymer. For this work, elastomeric polydimethylsiloxane (PDMS) molds were employed as not only stamps for direct contact printing of polymer inks but also templates for dewetting of polymer solutions under mild experimental conditions. We performed both negative patterning and positive patterning of a prototypical EC polymer and investigated the EC device characteristics according to solvents, solution concentrations, and pattern types. Eventually, the complex patterns, which cannot be realized by conventional shadow masking processes, and large-area structures were successfully demonstrated. We anticipate that these results will be applied to the development of various patterned devices and circuits, which may lead to further applications. |
| Databáze: | OpenAIRE |
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