Nanoscale tunnel field-effect transistor based on a complex-oxide lateral heterostructure

Autor: A. Müller, C. Şahin, M.Z. Minhas, B. Fuhrmann, M.E. Flatté, G. Schmidt
Přispěvatelé: Semiconductor Nanostructures and Impurities, Photonics and Semiconductor Nanophysics
Jazyk: angličtina
Rok vydání: 2019
Předmět:
Zdroj: Physical Review Applied, 11(6):064026. American Physical Society
ISSN: 2331-7043
Popis: We demonstrate a tunnel field effect transistor based on a lateral heterostructure patterned from an $\mathrm{LaAlO_3/SrTiO_3}$ electron gas. Charge is injected by tunneling from the $\mathrm{LaAlO_3}$/$\mathrm{SrTiO_3}$ contacts and the current through a narrow channel of insulating $\mathrm{SrTiO_3}$ is controlled via an electrostatic side gate. Drain-source I/V-curves have been measured at low and elevated temperatures. The transistor shows strong electric-field and temperature-dependent behaviour with a steep sub-threshold slope %of up to as small as $10\:\mathrm{mV/decade}$ and a transconductance as high as $g_m\approx 22 \: \mathrm{\mu A/V}$. A fully consistent transport model for the drain-source tunneling reproduces the measured steep sub-threshold slope.
Comment: 20 pages, 6 figures, Supplementary material: 4 pages, 2 figures
Databáze: OpenAIRE