Impact of structure on mechanical properties and oxidation behavior of magnetron sputtered cubic and hexagonal MoNx thin films
| Autor: | David Kokalj, Dominic Stangier, Wolfgang Tillmann |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2021 |
| Předmět: |
Materials science
Oxide Oxide formation X-ray absorption spectroscopy Surfaces and Interfaces Substrate (electronics) Crystal structure Sputter deposition Nitride Surfaces Coatings and Films Amorphous solid X-ray diffraction TP250-261 chemistry.chemical_compound Molybdenum nitride Chemical engineering chemistry Industrial electrochemistry Oxidation state TA401-492 Thin film Materials of engineering and construction. Mechanics of materials Magnetron sputtering |
| Zdroj: | Applied Surface Science Advances, Vol 5, Iss, Pp 100119-(2021) |
| ISSN: | 2666-5239 |
| Popis: | Molybdenum nitride films exhibit superior tribological properties, due to the possibility to form Magneli phases when exposed to elevated temperatures. MoNx thin films were deposited by means of DC magnetron sputtering, while varying the bias-voltage and substrate temperature in regard to control the crystalline structure of the thin films. XRD experiments reveal a two-phase structure consisting of over stoichiometric cubic B1-NaCl and hexagonal MoNx phases for a high bias-voltage, whereas for lower bias-voltages the metastable cubic MoN phase was observed. Enhanced mechanical properties, obtained by means of nanoindentation, were analyzed for the thin films exhibiting the two-phase composite structure. The influence of the phase composition on the oxidation behavior, like oxidation state and formed oxide phases, was studied by means of in-situ XRD and XAS experiments using synchrotron radiation up to 700 °C. The oxidation processes start at 400 °C, forming oxides in amorphous state. Thin films composed of hexagonal MoN reveal a higher oxidation state up to 400 °C compared to cubic structured thin films, which changes above 400 °C. MoO2 and MoO3 were formed as primary oxides, independent from the crystalline structure of the deposited film. With an increase of temperature to 550 °C and 700 °C, the Magneli-phases Mo9O26/Mo8O23 and Mo4O11 were formed. |
| Databáze: | OpenAIRE |
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