High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets
| Autor: | A. Galvanauskas, Martin Richardson, Simi George, John Nees, Bruno M. LaFontaine, Aghapi Mordovanakis, Kai Chung Hou, Kazutoshi Takenoshita |
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| Rok vydání: | 2008 |
| Předmět: |
Materials science
business.industry Lasers Extreme ultraviolet lithography Energy conversion efficiency Water chemistry.chemical_element Radiation Atomic and Molecular Physics and Optics Optics chemistry Tin Fiber laser Photography Fiber Optic Technology Waveform Optoelectronics Ytterbium business Lithography Beam (structure) |
| Zdroj: | Optics Express. 16:965 |
| ISSN: | 1094-4087 |
| DOI: | 10.1364/oe.16.000965 |
| Popis: | In this paper we report the development of nanosecond-pulsed fiber laser technology for the next generation EUV lithography sources. The demonstrated fiber laser system incorporates large core fibers and arbitrary optical waveform generation, which enables achieving optimum intensities and other critical beam characteristics on a laser-plasma target. Experiment demonstrates efficient EUV generation with conversion efficiency of up to 2.07% for in-band 13.5-nm radiation using mass-limited Sn-doped droplet targets. This result opens a new technological path towards fiber laser based high power EUV sources for high-throughput lithography steppers. |
| Databáze: | OpenAIRE |
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