XPS and AES study of adsorption and desorption of NO on W(100)
| Autor: | R.E. Viturro, Mordechai Folman, E. Pelach |
|---|---|
| Rok vydání: | 1985 |
| Předmět: |
Inorganic chemistry
Oxide Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics Nitrogen Surfaces Coatings and Films chemistry.chemical_compound Adsorption chemistry X-ray photoelectron spectroscopy Desorption Materials Chemistry Molecule Surface layer Stoichiometry |
| Zdroj: | Surface Science. 161:553-566 |
| ISSN: | 0039-6028 |
| DOI: | 10.1016/0039-6028(85)90827-1 |
| Popis: | The adsorption of NO on W(100) at 300 K has been investigated by XPS and EAS over a range of coverages and temperatures. At room temperature the adsorption is dissociative. From the results obtained it was concluded that in the low coverage range the nitrogen and oxygen atoms adsorb on the five coordinate four fold symmetry sites, C5. Intermediat and high exposures cause surface reconstruction. Nitrogen atoms are most probably adsorbed beneath a composite WO surface layer. The N:O stoichiometry was 1:1 throughout adsorption, and the saturation coverage is estimated to be ca. 1.1 × 1015 molecules per cm2. Heating of thesystem causes rearrangement of the oxide layer and desorption of nitrogen at about 1000 K. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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