A new linearly extended bifocal microwave plasma device

Autor: Mathias Kaiser, H. Urban, K.-M. Baumgärtner, E. Räuchle, R. Emmerich, Peter Elsner
Přispěvatelé: Publica
Rok vydání: 2001
Předmět:
Zdroj: Surface and Coatings Technology. :939-942
ISSN: 0257-8972
DOI: 10.1016/s0257-8972(01)01319-6
Popis: A new kind of linearly extended plasma source was developed. The prototype of such a device was built up as a barrel with elliptical cross-section. This bifocal shape has two focus lines. A linearly extended microwave antenna is placed along one focus line and the sector of plasma treatment is placed along the second focus line. The antenna is a linear emitter of radial divergent microwave radiation. In this work, a frequency of 2.45 GHz in pulsed and continuous wave (CW) mode was used. The power up to 6 kW CW and 10 kW pulsed is adjustable, pulse on/off times are variable in a wide field. The microwave is reflected by the metallic walls of the barrel and concentrated in the second focus line apart from the antenna. There a quartz tube is placed, that can be evaporated and filled with a working gas at a pressure between 10 2 and 10 5 Pa. The presented experiments have been done with Argon up to atmospheric pressure at a gas flow up to 6 slm.
Databáze: OpenAIRE