Influence of multilevel crystallization on the intensity oscillations of diffracted high-energy electrons during growth of aluminum arsenide by molecular beam epitaxy
| Autor: | V. V. Korablev, S. Yu. Karpov, A. N. Alekseev, M.A. Maiorov |
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| Předmět: |
Diffraction
Materials science Physics and Astronomy (miscellaneous) business.industry Oscillation Electron Molecular physics law.invention Arsenide Condensed Matter::Materials Science chemistry.chemical_compound Optics chemistry law Specular reflection Crystallization business Intensity (heat transfer) Molecular beam epitaxy |
| Zdroj: | Scopus-Elsevier |
| Popis: | Theoretical and experimental investigations are made of the influence of multilevel crystallization on oscillation of the specular reflection intensity of diffracted high-energy electrons during growth of aluminum arsenide by molecular beam epitaxy. The kinematic approximation is used to construct a model to analyze the profile of the oscillation curve and its dependence on the filling of the excess layers. The theoretical predictions are compared with the experimental data. |
| Databáze: | OpenAIRE |
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