Investigation of the refractive index repeatability for tantalum pentoxide coatings, prepared by physical vapor film deposition techniques
| Autor: | Mark Schürmann, Josephine Wolf, Lars Mechold, Kai Starke, Martin Bischoff, Michael Kennedy, Henrik Ehlers, Thomas Hegemann, Olaf Stenzel, Norbert Kaiser, S Schippel, Florian Carstens, Tobias Nowitzki, R Rauhut, Rüdiger Foest, Detlev Ristau, J. Harhausen, Holger Reus, Jens Schumacher, Harro Hagedorn, Alfons Zöller, Steffen Wilbrandt |
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| Přispěvatelé: | Publica |
| Rok vydání: | 2017 |
| Předmět: |
Materials science
business.industry Materials Science (miscellaneous) 02 engineering and technology Repeatability Sputter deposition 021001 nanoscience & nanotechnology 01 natural sciences Evaporation (deposition) Industrial and Manufacturing Engineering 010309 optics Condensed Matter::Materials Science chemistry.chemical_compound Optics Absorption edge chemistry Physics::Plasma Physics Physical vapor deposition 0103 physical sciences Tantalum pentoxide Deposition (phase transition) Business and International Management 0210 nano-technology business Refractive index |
| Zdroj: | Applied optics. 56(4) |
| ISSN: | 1539-4522 |
| Popis: | Random effects in the repeatability of refractive index and absorption edge position of tantalum pentoxide layers prepared by plasma-ion-assisted electron-beam evaporation, ion beam sputtering, and magnetron sputtering are investigated and quantified. Standard deviations in refractive index between 4 ∗ 10 -4 and 4 ∗ 10 -3 have been obtained. Here, lowest standard deviations in refractive index close to our detection threshold could be achieved by both ion beam sputtering and plasma-ion-assisted deposition. In relation to the corresponding mean values, the standard deviations in band-edge position and refractive index are of similar order. |
| Databáze: | OpenAIRE |
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