Discharge source-dependent variation in the densities of active species in the flowing afterglows of N 2 RF and UHF plasmas
| Autor: | André Ricard, Yu Kwon Kim, Byungwook Jeon, Jean-Philippe Sarrette |
|---|---|
| Přispěvatelé: | Centre d'Études et de Recherche en Gestion d'Aix-Marseille (CERGAM), Aix Marseille Université (AMU)-Université de Toulon (UTLN), LAboratoire PLasma et Conversion d'Energie (LAPLACE), Université Toulouse III - Paul Sabatier (UT3), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université Fédérale Toulouse Midi-Pyrénées, Plasmas Réactifs Hors Equilibre (LAPLACE-PRHE), Université Fédérale Toulouse Midi-Pyrénées-Université Toulouse III - Paul Sabatier (UT3) |
| Rok vydání: | 2017 |
| Předmět: |
Oxide
Analytical chemistry General Physics and Astronomy 02 engineering and technology N2+ density N2(A) density 01 natural sciences law.invention [SPI]Engineering Sciences [physics] chemistry.chemical_compound N density law Impurity v > 13) density 0103 physical sciences General Materials Science Gas-filled tube 010302 applied physics Chemistry Plasma N2(X 021001 nanoscience & nanotechnology Volumetric flow rate N2 afterglows Ultra high frequency Atomic physics 0210 nano-technology Microwave Excitation |
| Zdroj: | Current Applied Physics Current Applied Physics, 2017, 17 (7), pp.945-950. ⟨10.1016/j.cap.2017.04.006⟩ |
| ISSN: | 1567-1739 |
| Popis: | With a potential application to surface modification of oxide materials in mind, active species in RF and microwave (UHF) N 2 afterglows were analyzed in our newly designed flowing reactors. For both plasma systems, discharge of N 2 was generated in a long quartz tube with a small diameter (dia. 5–6 mm) and then was directly injected into a chamber with a large diameter of 15–20 cm. The discharge condition was set to be similar between the two systems; the gas pressure, flow rate and the applied power were 6 Torr, 0.6 slm and 100 W, respectively. Under this condition, the residence time at the chamber inlet was (1–3) x 10 −3 s. The RF and UHF afterglows were formed in the chamber with luminous jets from the end of the discharge tube. However, we found that the densities of active species were quite source-dependent; N and N 2 (A) densities were higher in UHF than in RF in spite of more O-atoms impurity. The origin of such difference is also attributed to the inherent difference in the nature of excitation between the two plasma sources; RF is more vibrational and is longer than UHF. |
| Databáze: | OpenAIRE |
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