Crystalline silicon surface passivation by the negative charge dielectric film

Autor: Hui Shen, Zongcun Liang, Chengkun Feng, Jiatong Cai, Daming Chen
Jazyk: angličtina
Předmět:
Zdroj: Physics Procedia. :51-55
ISSN: 1875-3892
DOI: 10.1016/j.phpro.2011.06.056
Popis: Surface passivation is one of the key factors to the high efficiency solar cells. In this paper negative charge dielectric films (Al2O3)x(TiO2)1-x used as backside surface passivation for crystalline silicon solar cells were prepared by the low-cost sol-gel method. The relation between the passivation properties of the films and the preparation technology was investigated and optimized. The surface passivation characteristic of the alloyed (Al2O3)x(TiO2)1-x thin films are in correlation with sintering temperature. The surface recombination velocity of 1260 cm/s of the thin layers can be achieved at sintering temperature 400 °C. The alloyed dielectric films also have feasible optical properties which can be acted as backside reflector if combined with metal contact.
Databáze: OpenAIRE