Surface and bulk properties of electron beam evaporated carbon films
| Autor: | R. Thielsch, A. Möbius, J. Besold, N. Matz, René Born, C Frenzel |
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| Rok vydání: | 1997 |
| Předmět: |
Materials science
Metals and Alloys Analytical chemistry Surfaces and Interfaces Evaporation (deposition) Electron beam physical vapor deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials Amorphous solid law.invention symbols.namesake Carbon film Amorphous carbon law Materials Chemistry symbols Electrical measurements Scanning tunneling microscope Raman spectroscopy |
| Zdroj: | Scopus-Elsevier |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/s0040-6090(96)09000-1 |
| Popis: | Amorphous carbon films deposited by electron beam evaporation onto glass and oxidized Si(111) substrates have been investigated by local probe methods, spectroscopic techniques and electrical measurements. Clusters ∼ 15 A in diameter are visible in the topography imaged by scanning tunneling microscopy. The microscopic potential distribution mapped by scanning tunneling polcntiomciry is characterized by a disturbed lateral potential drop in the submicrometcr scale. X-ray diffraction analysis reveals the amorphous structure of the evaporated film. In the Raman spectrum two broad lines at 1585 cm −1 and at 1375 cm −1 are observed. We obtained an optical absorption coefficient α greater than 10 5 cm −1 , and a small optical gap of about 0.2 eV. The electrical resistance at low temperatures can be fitted to the form R α exp( T 0 / T ) ½ . Our experimental results indicate a structure consisting of very small graphite (sp 2 ) clusters with an incomplete trigonally atomic arrangement. The changed bonding configuration between the clusters may include sp 3 sites. |
| Databáze: | OpenAIRE |
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