Ultrahigh-density trench capacitors in silicon and their application to integrated DC-DC conversion

Autor: Mickael Pommier, K Katarzyna Nowak, S Iochem, Sophie Ledain, Eric Pieraerts, L Guiraud, Henk Jan Bergveld, Jorge Ferreira, Catherine Bunel, F. Le Cornec, Fred Roozeboom
Rok vydání: 2009
Předmět:
Zdroj: Procedia Chemistry. 1:1435-1438
ISSN: 1876-6196
DOI: 10.1016/j.proche.2009.07.358
Popis: This paper addresses silicon-based integration of passive components applied to 3D integration with dies of other technologies within one package. Particularly, the development of high-density trench capacitors has enabled the realization of small-formfactor DC-DC converters. As illustration, an integrated inductive DC-DC converter based on flip-chipping a 65-nm CMOS active die on a PICS™ (Passive-Integration Connecting Substrate) passive die is described. The PICS die includes high-density (80 nF/mm2) integrated MOS trench capacitors. A converter peak efficiency of 87.5% is achieved at Vin=1.2 V, Vout=0.95 V, Iout=100 mA and 100-MHz switching frequency. The concept enables further integration with sensors, actuators and MEMS.
Databáze: OpenAIRE