The dependence of indium incorporation on specified temperatures in growing InGaN/GaN heterostructure using MOCVD technique

Autor: M.A. Ahmad, Sha Shiong Ng, Zainuriah Hassan, C. Chevallier, Sidi Ould Saad Hamady, M.A.A.Z. Md Sahar, A.S. Yusof
Přispěvatelé: INOR - Universiti Sains Malaysia, Laboratoire Matériaux Optiques, Photonique et Systèmes (LMOPS), CentraleSupélec-Université de Lorraine (UL)
Jazyk: angličtina
Rok vydání: 2020
Předmět:
Zdroj: Materials Research Bulletin
Materials Research Bulletin, Elsevier, 2020, ⟨10.1016/j.materresbull.2020.111176⟩
ISSN: 0025-5408
1873-4227
DOI: 10.1016/j.materresbull.2020.111176⟩
Popis: International audience; In this study, InGaN/GaN heterostructures were grown using metal organic vapor deposition (MOCVD) at different temperatures (800°C, 750°C and 700°C). The structural, crystallinity, surface morphology and optical properties were investigated using X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM) and ultraviolet-visible (UV-Vis) spectrophotometer, respectively. From observation, it is found that the indium composition was obtained from XRD through the process of fitting of the simulation. The process of indium incorporation is found to be sensitive to temperature variances. When the temperature is further reduced, the indium incorporation process would become stagnant as the decomposition process of ammonia would be less efficient. FE-SEM images have revealed surface-related defects such as V-pits. The secondary energy gap is obtained from the optical characterization which confirmed the incorporation of indium in the epilayers.
Databáze: OpenAIRE