Development of a soft UV-NIL steprepeat and lift-off process chain for high speed metal nanomesh fabrication
| Autor: | Hans Leichtfried, Manuel W. Thesen, Martin Messerschmidt, Michael J. Haslinger, Sonja Kopp, Tina Mitteramskogler, Michael Mühlberger |
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| Rok vydání: | 2020 |
| Předmět: |
Fabrication
Materials science Bioengineering 02 engineering and technology Surface finish 010402 general chemistry 01 natural sciences chemistry.chemical_compound Surface roughness General Materials Science Electrical and Electronic Engineering Curing (chemistry) business.industry Mechanical Engineering PDMS stamp General Chemistry 021001 nanoscience & nanotechnology 0104 chemical sciences Nanomesh chemistry Resist Mechanics of Materials Optoelectronics Wetting 0210 nano-technology business |
| Zdroj: | Nanotechnology. 31(34) |
| ISSN: | 1361-6528 |
| Popis: | In this work, we present a fabrication procedure of metal nanomesh arrays with the newly developed nanoimprint resist mr-NIL212FC used in a bi-layer resist system for a lift-off process. We comparatively analyzed and evaluated nanomeshes fabricated with a freshly prepared h-PDMS/PDMS stamp and a stamp used 501 times. Therefore, we first performed a step&repeat imprint test run in a self-built low cost step&repeat UV-NIL setup. We inspected the imprint behavior of the stamp, the UV-transmission through the stamp as well as stamp lifetime and stamp degradation with regard to the possible changes of its surface roughness. The nanomesh fabrication process is characterized by a good lift-off performance, leading to a low defect density of |
| Databáze: | OpenAIRE |
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