| Autor: |
Yuqing Zuo, Zeyu Wang, Haojie Zhao, Lianqi Zhao, Lunjia Zhang, Beili Yi, Wenda Bao, Yue Zhang, Longxing Su, Yi Yu, Jin Xie |
| Rok vydání: |
2022 |
| Předmět: |
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| Zdroj: |
ACS applied materialsinterfaces. 14(12) |
| ISSN: |
1944-8252 |
| Popis: |
Bottom-up synthesis based on site-selective atomic layer deposition is a powerful atomic-scale processing approach to fabricate materials with desired functionalities. Typical selective atomic layer deposition (ALD) can be achieved using selective activation of a growth area or selective deactivation of a protected area. In this work, we explored the site selectivity based on the difference of the inherent surface reactivity between different materials and within the same materials. By sequentially applying two site-selective atomic layer deposition, the ALD Pd catalyst is spatially confined on ALD SnO |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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