Examination of high Q factor multilayer chip inductor applied magnetic flux path control technology
| Autor: | Yinggang Bu, Mitsuhide Sato, Tsutomu Mizuno, Kazuhiro Shimura, Yasuyuki Kono |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2020 |
| Předmět: |
Materials science
Skin effect 020209 energy Flux Proximity effect Hardware_PERFORMANCEANDRELIABILITY 02 engineering and technology Inductor Multilayer chip inductor 020401 chemical engineering Hardware_GENERAL ddc:330 Hardware_INTEGRATEDCIRCUITS 0202 electrical engineering electronic engineering information engineering 0204 chemical engineering Proximity effect (electromagnetism) Magnetic flux path control technology business.industry Chip Magnetic flux Power (physics) General Energy factor Q factor Optoelectronics lcsh:Electrical engineering. Electronics. Nuclear engineering business lcsh:TK1-9971 |
| Zdroj: | Energy Reports, Vol 6, Iss, Pp 491-496 (2020) |
| ISSN: | 2352-4847 |
| Popis: | Inductors used for power supplies can be miniaturized by increasing the frequency. However, as the frequency increases, the loss in the inductor increases, which hinders the improvement of efficiency. This study suggests a flux path control technology as a method for reducing inductor loss. Herein, we investigate high Q value chip inductors with magnetic flux path control technology. By applying magnetic flux path control technology, the Q value was improved by 35% in comparison with conventional multilayer chip inductors. Keywords: Multilayer chip inductor, Magnetic flux path control technology, Q factor, Skin effect, Proximity effect |
| Databáze: | OpenAIRE |
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