Broadband Antireflective Structures on PMMA by Plasma Treatment

Autor:	Ulrike Schulz, Robert Leitel, Antje Kaless, Norbert Kaiser
Přispěvatelé:	Publica
Rok vydání:	2007
Předmět:	Materials science Argon Polymers and Plastics business.industry Scattering chemistry.chemical_element Plasma treatment Plasma Condensed Matter Physics law.invention Optics Anti-reflective coating chemistry law Oxygen plasma Broadband business Ion energy
Zdroj:	Plasma Processes and Polymers. 4:S878-S881
ISSN:	1612-8869 1612-8850
DOI:	10.1002/ppap.200732103
Popis:	Stochastic subwavelength structures on polymethylmetacrylate (PMMA) surfaces were produced by low-pressure argon/oxygen plasma treatment. The modified surfaces show antireflective properties exhibiting low scattering losses depending on the size and the density of the structure. It is demonstrated that the antireflection performance is a function of the mean ion energy and working pressure that are controllable by process parameters, namely plasma power and gas flow. A model is suggested that assumes a self-assembling etch mask as reason for the growth of the pins with about 70–90 nm in lateral dimension and up to 600 nm in height.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ab74151a5f5fafb98135fe5ddf11718a https://doi.org/10.1002/ppap.200732103 Zobrazit plný text záznamu Plný text