Sb-implanted ZnO ultra-thin films

Autor: Graziella Malandrino, Antonino Gulino, Maria R. Catalano, Isodiana Crupi, Salvatrice Millesi, Francesco Priolo, Giuliana Impellizzeri
Přispěvatelé: Millesi, Salvatrice, Catalano, Maria Rita, Impellizzeri, Giuliana, Crupi, Isodiana, Malandrino, Graziella, Priolo, Francesco, Gulino, Antonino
Rok vydání: 2017
Předmět:
Zdroj: Materials science in semiconductor processing 69 (2017): 32–35. doi:10.1016/j.mssp.2016.12.025
info:cnr-pdr/source/autori:Millesi, Salvatrice; Catalano, Maria Rita; Impellizzeri, Giuliana; Crupi, Isodiana; Malandrino, Graziella; Priolo, Francesco; Gulino, Antonino/titolo:Sb-implanted ZnO ultra-thin films/doi:10.1016%2Fj.mssp.2016.12.025/rivista:Materials science in semiconductor processing/anno:2017/pagina_da:32/pagina_a:35/intervallo_pagine:32–35/volume:69
ISSN: 1369-8001
DOI: 10.1016/j.mssp.2016.12.025
Popis: Mild heating of the Zn(C5F6HO2)(2)center dot 2H(2)O center dot CH3(OCH2CH2)(2)OCH3 precursor allowed MOCVD deposition of ZnO films, in a low-pressure horizontal hot-wall reactor, on ITO substrates. The ZnO films were subsequently implanted with Sb ions. XRD measurements provided evidence that they consist of hexagonal, (002) and (101) oriented, crystals. UV-vis spectra showed that the transmittance of these films in the visible region is about 90%. The Sb implanted ZnO film showed a current-voltage characteristic that resembles that of a rectifying diode. This study represents the first example of Sb-implantation in ZnO films obtained by MOCVD.
Databáze: OpenAIRE