Surface characterization of feldspathic ceramic using ATR FT-IR and ellipsometry after various silanization protocols
Autor: | Paula Benetti, José Renato Cavalcanti Queiroz, Fernando Eidi Takahashi, Marco Antonio Bottino, Alvaro Della Bona, Luiz Fernando Cappa de Oliveira, Mutlu Özcan |
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Přispěvatelé: | University of Zurich, Queiroz, José Renato Cavalcanti |
Jazyk: | angličtina |
Rok vydání: | 2012 |
Předmět: |
Ceramics
Hot Temperature Time Factors Materials science Optical Phenomena Potassium Compounds Surface Properties Scanning electron microscope Carbon Compounds Inorganic 610 Medicine & health chemistry.chemical_compound 10068 Clinic of Reconstructive Dentistry 2211 Mechanics of Materials Ellipsometry Materials Testing Spectroscopy Fourier Transform Infrared Surface roughness Humans General Materials Science Ceramic Composite material General Dentistry Spectrum Analysis Silicon Compounds Temperature Water Humidity Silanes Dental Porcelain Silane 3500 General Dentistry 2500 General Materials Science Dental Polishing Refractometry chemistry Distilled water Mechanics of Materials visual_art Attenuated total reflection Silanization Lasers Gas Microscopy Electron Scanning visual_art.visual_art_medium Methacrylates Aluminum Silicates |
DOI: | 10.5167/uzh-75552 |
Popis: | Objectives This study characterized the feldspathic ceramic surfaces after various silanization protocols. Methods Ceramic bars (2 mm × 4 mm × 10 mm) ( N = 18) of feldpathic ceramic (VM7, VITA Zahnfabrik) were manufactured and finished. Before silane application, the specimens were ultrasonically cleaned in distilled water for 10 min. The ceramic specimens were randomly divided into nine groups ( N = 2 per group) and were treated with different silane protocols. MPS silane (ESPE-Sil, 3M ESPE) was applied to all specimens and left to react at 20 °C for 2 min (G20). After drying, the specimens were subjected to heat treatment in an oven at 38 °C (G38), 79 °C (G79) or 100 °C (G100) for 1 min. Half of the specimens of each group were rinsed with water at 80 °C for 15 s (G20B, G38B, G79B, G100B). The control group (GC) received no silane. Attenuated total reflection infrared Fourier transform analysis (ATR FT-IR) was performed using a spectrometer. Thickness of silane layer was measured using a spectroscopic ellipsometer working in the λ = 632.8 nm (He–Ne laser) at 70° incidence angle. Surface roughness was evaluated using an optical profilometer. Specimens were further analyzed under the Scanning Electron Microscopy (SEM) to observe the topographic patterns. Results ATR FT-IR analysis showed changes in Si–O peaks with enlarged bands around 940 cm −1 . Ellipsometry measurements showed that all post-heat treatment actions reduced the silane film thickness (30.8–33.5 nm) compared to G20 (40 nm). The groups submitted to rinsing in hot water (B groups) showed thinner silane films (9.8–14.4 nm) than those of their corresponding groups (without washing) (30.8–40 nm). Profilometer analysis showed that heat treatments (Ra ≈ 0.10–0.19 μm; Rq ≈ 0.15–0.26 μm) provided a smoother surface than the control group (Ra ≈ 0.48 μm; Rq ≈ 0.65 μm). Similar patterns were also observed in SEM images. Significance Heat treatment after MPS silane application improved the silane layer network. Rinsing with boiling water eliminated the outmost unreacted regions of the silane yielding to thinner film thicknesses. |
Databáze: | OpenAIRE |
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