Inelastic photoelectron diffraction from Si

Autor:	R. Rochow, Ezio Puppin, Carlo Carbone
Rok vydání:	1992
Předmět:	Physics Diffraction business.industry Surface plasmon Physics::Optics Inelastic scattering Photoelectric effect Spectral line Optics Physics::Atomic and Molecular Clusters Polar coordinate system Atomic physics business Single crystal Plasmon
Zdroj:	Physical Review B. 46:13215-13219
ISSN:	1095-3795 0163-1829
DOI:	10.1103/physrevb.46.13215
Popis:	We present inelastic photoelectron-diffraction data from Si(100) on the angular dependence of the Si 2p peak and its plasmon losses taken by scanning the polar angle from [001] to [110]. The data show that plasmon damping only occurs if the atomic chains that give rise to forward-scattering peaks contain more than three atoms sufficiently close to each other. If, as along the [113] direction, the atoms are arranged in well-separated doublets, the photoelectrons are effectively focused but no defocusing occurs. For this reason, plasmon damping is not observed in this case, whereas it is clearly observed along the [111] direction, where the atoms are closer and defocusing can take place. Finally, we will discuss the angular dependence of the intensity of the spectral region usually labeled as ``background'' and we will point out the possible connection of our results with the problem of the weight of intrinsic plasmons in photoemission spectra.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a9850f512159d4aba6292bd19ddf1430 https://doi.org/10.1103/physrevb.46.13215 Zobrazit plný text záznamu