Observation and origin of the Δ manifold in Si:P δ layers

Autor: Davide Curcio, Ann Julie Holt, Frode S. Strand, Jill A. Miwa, Thomas Nyborg, Justin W. Wells, Philip Hofmann, Raluca Maria Stan, Sanjoy K. Mahatha, Alex Schenk, S. P. Cooil, Marco Bianchi
Rok vydání: 2020
Předmět:
Zdroj: Holt, A J, Mahatha, S K, Stan, R M, Strand, F S, Nyborg, T, Curcio, D, Schenk, A K, Cooil, S P, Bianchi, M, Wells, J W, Hofmann, P & Miwa, J A 2020, ' Observation and origin of the Δ manifold in Si:P δ layers ', Physical Review B, vol. 101, no. 12, 121402 . https://doi.org/10.1103/PhysRevB.101.121402
ISSN: 2469-9969
2469-9950
DOI: 10.1103/physrevb.101.121402
Popis: By creating a sharp and dense dopant profile of phosphorus atoms buried within a silicon host, a two-dimensional electron gas is formed within the dopant region. Quantum confinement effects induced by reducing the thickness of the dopant layer, from $4.0\phantom{\rule{0.28em}{0ex}}\mathrm{nm}$ to the single-layer limit, are explored using angle-resolved photoemission spectroscopy. The location of theoretically predicted, but experimentally hitherto unobserved, quantum well states known as the $\mathrm{\ensuremath{\Delta}}$ manifold is revealed. Moreover, the number of carriers hosted within the $\mathrm{\ensuremath{\Delta}}$ manifold is shown to be strongly affected by the confinement potential, opening the possibility to select carrier characteristics by tuning the dopant-layer thickness.
Databáze: OpenAIRE