Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker
| Autor: | Jaeyong Lee, Jin Kon Kim, Jichoel Park, Kanniyambatti L. Vincent Joseph, Kyu Seong Lee, Chungryong Choi, Jongheon Kwak, Seonghyeon Ahn |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2017 |
| Předmět: |
Multidisciplinary
Fabrication Materials science Science General Physics and Astronomy Nanotechnology 02 engineering and technology General Chemistry Substrate (electronics) 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Article General Biochemistry Genetics and Molecular Biology 0104 chemical sciences Nanolithography Phase (matter) Block (telecommunications) Copolymer lcsh:Q Lamellar structure lcsh:Science 0210 nano-technology Linker |
| Zdroj: | Nature Communications, Vol 8, Iss 1, Pp 1-8 (2017) NATURE COMMUNICATIONS(8) Nature Communications |
| ISSN: | 2041-1723 |
| Popis: | Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Although various methods have been reported to achieve dual nanopatterns, all the methods need sophisticated processes using E-beam. Here, we synthesized a miktoarm block copolymer capable of cleavage of one block by ultraviolet. Original cylindrical nanodomains of synthesized block copolymer were successfully transformed to lamellar nanodomains due to the change of molecular architecture by ultraviolet. We fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate. We also prepared dual nanopatterns utilizing another phase transformation from spheres to cylinders in a block copolymer with higher interaction parameter. Since our concept has versatility to any block copolymer, it could be employed as next-generation nanolithography. Block copolymers that form nanodomains and are used in nanolithography usually do not form nanopatterns with multiple shapes. Here the authors report a block copolymer that allows for UV- induced cleavage of one arm and demonstrate the transformation of the cylindrical to the lamellar nanodomain. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|