Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications

Autor:	Denise Freitas Siqueira Petri, Balakrishnan P. Shanmugaraj, S. C. Murugavel, Lizong Dai, Balaji Krishnasamy
Rok vydání:	2020
Předmět:	Chalcone Condensation polymer Materials science Polymers and Plastics General Chemical Engineering 02 engineering and technology Epoxy Photoresist 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences ESPECTROSCOPIA 0104 chemical sciences Analytical Chemistry chemistry.chemical_compound chemistry Chain (algebraic topology) Group (periodic table) visual_art Polymer chemistry visual_art.visual_art_medium 0210 nano-technology Photoinitiator
Zdroj:	Repositório Institucional da USP (Biblioteca Digital da Produção Intelectual) Universidade de São Paulo (USP) instacron:USP
ISSN:	1563-5341 1023-666X
Popis:	Dual functional photosensitive epoxy resins were synthesized by solution polycondensation of 1,3-bis(4-hydroxyphenyl)propenone (BHPP) and 3-(4-hydroxy-3-methoxyphenyl)-1-(4-hydroxyphenyl)propenone ...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a78da89898ba78de17221739e30eba2b https://doi.org/10.1080/1023666x.2020.1780849 Zobrazit plný text záznamu