New ASPN high efficiency treatment of ASTM M2 steel
| Autor: | Alexandre da Silva Rocha, Edison Silva Lima, Leonardo Fonseca Oliveira |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2021 |
| Předmět: |
Materials science
Surface treatment bias voltage Deposition (phase transition) General Materials Science Materials of engineering and construction. Mechanics of materials ASTM M2 Treatment system business.industry Mechanical Engineering Biasing Nitretação a plasma Plasma nitriding Plasma surface treatment Condensed Matter Physics Aço-ferramenta Mechanics of Materials Bias voltage TA401-492 Optoelectronics Active screen active screen business Nitriding Voltage |
| Zdroj: | Repositório Institucional da UFRGS Universidade Federal do Rio Grande do Sul (UFRGS) instacron:UFRGS Materials Research, Vol 24, Iss 1 (2021) Materials Research v.24 n.1 2021 Materials research (São Carlos. Online) Universidade Federal de São Carlos (UFSCAR) instacron:ABM ABC ABPOL Materials Research, Volume: 24, Issue: 1, Article number: e20200404, Published: 15 JAN 2021 |
| Popis: | Plasma nitriding treatments are applied to achieve excellent surface properties on steel parts and tools. Active screen plasma nitriding (ASPN) does not have the defects presents in direct nitriding plasma treatments (DCPN). However, ASPN require much longer processing times to develop surface layers as deep as those of DCPN. This work presents the development of a biased ASPN treatment system, to investigate the possibility of achieving greater efficiency. The treatments were performed on ASTM M2 steel samples using the same processing parameters in 4 different configurations: DCPN, ASPN and 2 active screen plasma nitriding with biased specimens voltage: one was called "bright bias", because biased voltage is high enough to develop a plasma glow on the samples, and the other "dark bias", where no plasma glow sheath is seen on the samples. The active screen dark biased treatment presented the best results. These results could be understood by the electromagnetic field generated by the bias source promoting the deposition of nitrogen ions on the surface of the part being treated. Therefore, it was demonstrated that the use of dark bias voltage in the active screen treatment in larger reactors is fundamental to achieve good nitriding results in smaller times. |
| Databáze: | OpenAIRE |
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