Study of screen printed metallization for polysilicon based passivating contacts

Autor:	M.K. Stodolny, Jochen Löffler, Yu Wu, Martijn Lenes, G.J.M. Janssen, E.H. Ciftpinar, Jurriaan Schmitz, Jan-Marc Luchies, L.J. Geerligs
Jazyk:	angličtina
Rok vydání:	2017
Předmět:	Photoluminescence Materials science Diffusion contact resistance 02 engineering and technology Chemical vapor deposition 01 natural sciences passivating contact polySi Metal High resolution electron microscopy 0103 physical sciences Electronic engineering fire through metallization 010302 applied physics contact recombination business.industry Contact resistance Doping 021001 nanoscience & nanotechnology visual_art visual_art.visual_art_medium Optoelectronics 0210 nano-technology business carrier selective contact polysilicon Recombination current
Zdroj:	Energy procedia, 124, 851-861. Elsevier
ISSN:	1876-6102
Popis:	We investigate contacting of n- and p-type polysilicon (polySi) passivating contact layers with industrial screen-printed metal pastes, examining both fire through (FT) and non-fire through (NFT) pastes. The n- and p-type polySi layers, deposited by low pressure chemical vapour deposition and doped by POCl3 diffusion, phosphorus implant, or BBr3 diffusion, result in excellent Jo, even for 50 nm thickness (
Databáze:	OpenAIRE
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