| Autor: |
Markus P. Benk, Ken Goldberg, Obert Wood, Jeremy McCord, Bryan S. Kasprowicz, Henry Kamberian, Pawitter Mangat, Wallow Thomas I, Yulu Chen |
| Přispěvatelé: |
Gargini, Paolo A, Ronse, Kurt G, Naulleau, Patrick P, Itani, Toshiro |
| Rok vydání: |
2017 |
| Předmět: |
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| Zdroj: |
International Conference on Extreme Ultraviolet Lithography 2017. |
| Popis: |
This paper provides experimental measurements of through-focus pattern shifts between contact holes in a dense array and a surrounding pattern of lines and spaces using the SHARP actinic microscope in Berkeley. Experimental values for pattern shift in EUV lithography due to 3D mask effects are extracted from SHARP microscope images and benchmarked with pattern shift values determined by rigorous simulations. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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