Effects of Ar ion bombardment by unbalanced magnetron sputtering on mechanical and thermal properties of Ti-Cu-Zr-Ni-Hf-Si thin film metallic glass
| Autor: | Junpei Kobata, Ken-ichi Miura |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2016 |
| Předmět: |
Materials science
Analytical chemistry 02 engineering and technology 01 natural sciences Condensed Matter::Materials Science Residual stress 0103 physical sciences lcsh:TA401-492 Astrophysics::Solar and Stellar Astrophysics General Materials Science Thermal stability Thin film Composite material Nuclear Experiment Deposition (law) 010302 applied physics Amorphous metal Mechanical Engineering Ion plating Sputter deposition 021001 nanoscience & nanotechnology Amorphous solid Mechanics of Materials Physics::Space Physics lcsh:Materials of engineering and construction. Mechanics of materials 0210 nano-technology |
| Zdroj: | Materials & Design, Vol 111, Iss, Pp 271-278 (2016) |
| ISSN: | 0264-1275 |
| Popis: | This study investigated the effects of Ar ion bombardment during deposition by unbalanced magnetron sputtering (UBMS) on the structure and mechanical and thermal properties of Ti–Cu–Zr–Ni–Hf–Si thin film metallic glass. It was found that Ar was incorporated into the amorphous structure of the deposited films because of the Ar ion bombardment and that the Ar content in the films could be changed from 0.2 at% to 14.7 at% by controlling the intensity of Ar ion bombardment. The thermal stability of the films was improved by the bombardment process. Further, the surface and cross-sectional morphologies of the films became very smooth and highly dense with an increase in the bombardment intensity. On the other hand, the density of the amorphous structure decreased with the increase in the Ar content. The hardness and Young's modulus also changed with the intensity of Ar ion bombardment. The change in the film hardness was due to the change in the residual stress in the films. Thus, Ar ion bombardment during deposition by UBMS is a useful method for improving the structure and mechanical and thermal properties of thin film metallic glasses. Keywords: Thin film metallic glass, Unbalanced magnetron sputtering, Ar ion bombardment, Mechanical and thermal properties |
| Databáze: | OpenAIRE |
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