CHEMICAL VAPOUR DEPOSITION OF THE Al-O-N SYSTEM
| Autor: | D. Thenegal, B. Aspar, B. Armas, C. Combescure |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 1991 |
| Předmět: |
010302 applied physics
Chemistry Environmental chemistry [PHYS.HIST]Physics [physics]/Physics archives 0103 physical sciences General Physics and Astronomy 02 engineering and technology Chemical vapor deposition 021001 nanoscience & nanotechnology 0210 nano-technology 01 natural sciences 7. Clean energy |
| Zdroj: | Journal de Physique IV Proceedings Journal de Physique IV Proceedings, EDP Sciences, 1991, 02 (C2), pp.C2-665-C2-672. ⟨10.1051/jp4:1991280⟩ |
| ISSN: | 1155-4339 1764-7177 |
| DOI: | 10.1051/jp4:1991280⟩ |
| Popis: | Using chemical vapour deposition, aluminium - oxygen-nitrogen coatings have been synthesized with aluminium trichloride, hydrogen, ammonia and nitrous oxide. The composition of the equilibrium phases is first determined by a thermodynamic calculation. The only AlON phase we investigate is ([MATH]) spinel aluminium oxynitride and it is considered as a stoichiometric phase with a composition of Al7O9N. The results indicate the existence fields of aluminium nitride and alumina and show the difficulty of obtaining the spinel aluminium oxynitride without other phases. Temperature, pressure and gas composition play an important part because they directly influence the reactivity of aluminium chloride. A hot-wall reactor is used for the experimental study. In this way, we obtain AlN, a mixture of AlN and [MATH] AlON, and [MATH] Al2O3. The annealed deposits show the stability of AlON obtained at 1270K. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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