Effect of the surface of a silicon substrate on the growth of ZnO films by a wet process
| Autor: | Shuichi Shibata, Hiroyo Segawa, Toshiharu Hayashi, Reiko Izumi, Tetsuji Yano |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2009 |
| Předmět: |
chemistry.chemical_classification
Morphology (linguistics) Materials science Base (chemistry) Silicon Inorganic chemistry Substrate (chemistry) chemistry.chemical_element General Chemistry Polyethylene glycol Condensed Matter Physics Ammonia chemistry.chemical_compound Silicone chemistry Chemical engineering Scientific method Materials Chemistry Ceramics and Composites |
| Zdroj: | J. Ceram. Soc. Jpn. 117(no. 3):289-293 |
| Popis: | Effects of a silicon substrate on growth of ZnO in a wet chemical process were investigated. ZnO has been fabricated from base solutions composed of Zn(NO 3 ) 2 , ammonia and polyethylene glycol at low temperatures by a wet chemical process. When a silicone substrate was immersed in the solution, flower-like ZnO was obtained on the substrate from the solution at pH = 10.4-10.9. In the case without the substrates, Zn(OH) 2 powders were obtained from the solution at pH = 10.4-10.9 and ZnO powders, which were not like flowers, were obtained from solution at pH ≤ 7.6. |
| Databáze: | OpenAIRE |
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