Challenges and Opportunities for Focused Ion Beam Processing at the Nano-Scale

Autor:	Christian Ulysse, Gilles Patriarche, Jacques Gierak, Ali Madouri, Ralf Jede, B. Schiedt, D. Lucot, E. Bourhis, Loïc Auvray, L. Bruchhaus, Xavier Lafosse
Rok vydání:	2009
Předmět:	Materials science General Computer Science Nanotechnology Instrumentation Nanoscopic scale Focused ion beam
Zdroj:	Microscopy Today. 17:14-17
ISSN:	2150-3583 1551-9295
DOI:	10.1017/s1551929509000479
Popis:	There is a solid consensus that new methods of structure fabrication, placement, and organization within the sub-10-nm resolution gap are urgently required to meet existing challenges in condensed matter, semiconductors, and biotechnologies. Standard top-down methods such as resist-based lithographies even used at the shortest available wavelengths have clearly identified limitations. On the other hand, bottom-up approaches, like scanning probe manipulation techniques, remain challenging when trying to generate reproducible, functional, and addressable nano-structures. Therefore, at the laboratory level new routes must be explored.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a0938c66279e432700ba09eec3e95af7 https://doi.org/10.1017/s1551929509000479 Zobrazit plný text záznamu Plný text ve formátu PDF