Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography
| Autor: | Andrew K. Whittaker, Anguang Yu, Todd R. Younkin, James P. Blinco, Kevin S. Jack, Heping Liu, Idriss Blakey, Michael J. Leeson |
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| Rok vydání: | 2010 |
| Předmět: |
Polymers and Plastics
Chemistry Extreme ultraviolet lithography Organic Chemistry Nanotechnology Photoresist law.invention Resist law visual_art Polymer chemistry Materials Chemistry visual_art.visual_art_medium X-ray lithography Photolithography Polycarbonate Lithography Next-generation lithography |
| Zdroj: | Macromolecular rapid communications. 31(16) |
| ISSN: | 1521-3927 |
| Popis: | A series of high-performance polycarbonates have been prepared with glass-transition temperatures and decomposition temperatures that are tunable by varying the repeat-unit chemical structure. Patterning of the polymers with extreme UV lithography has been achieved by taking advantage of direct photoinduced chain scission of the polymer chains, which results in a molecular-weight based solubility switch. After selective development of the irradiated regions of the polymers, feature sizes as small as 28.6 nm have been printed and the importance of resist-developer interactions for maximizing image quality has been demonstrated. |
| Databáze: | OpenAIRE |
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