| Autor: |
Rolf Kammerer, Franz Niedermeier, Wolfgang Kipferl, Stephan Henneck, Haim Pearl |
| Rok vydání: |
2020 |
| Předmět: |
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| Zdroj: |
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) |
| DOI: |
10.1109/asmc49169.2020.9185315 |
| Popis: |
This paper describes a plan of tests and several results of experiments that were performed to determine whether wafers that were milled using an inline xenon (Xe) plasma focused ion beam (PFIB) could continue processing through the standard production flow without being scrapped for contamination, yield, or reliability issues. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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