Electron scattering characteristics of polycrystalline metal transition films by in-situ electrical resistance measurements

Autor:	J. B. Sousa, I. G. Trindade, Diana C. Leitao, R. Fermento, Y. Pogorelev
Rok vydání:	2009
Předmět:	Grain growth Ion beam deposition Thin layers Materials science Electrical resistance and conductance Electrical resistivity and conductivity Grain boundary Thin film Composite material Condensed Matter Physics Electronic Optical and Magnetic Materials Amorphous solid
Zdroj:	Digital.CSIC. Repositorio Institucional del CSIC instname
ISSN:	0304-8853
DOI:	10.1016/j.jmmm.2009.03.014
Popis:	In-situ electrical resistance measurements were performed to obtain the scattering characteristics of very thin polycrystalline metal transition magnetic alloys grown by ion beam deposition (IBD) on specific underlayers. The experimental curves show size effects at small film thicknesses and important differences between Co85Fe15 and Ni81Fe19 thin layers grown on identical underlayers of Ta70 Å/Ru13 Å. The largest difference was observed in Ni81Fe19 films grown on underlayers of amorphous Ta70 Å. The experimental curves of electrical resistivity/conductivity variation with layer thickness were well fit within the Mayadas and Shatzkes (M-S) model, assuming specific formulations for grain growth with layer thickness. © 2009 Elsevier B.V. All rights reserved.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9d5baabc30e9418ea117c99570074f9a https://doi.org/10.1016/j.jmmm.2009.03.014 Zobrazit plný text záznamu Full Text from ScienceDirect