Structural properties of Ge nanocrystals synthesized by a PVD nanocluster source
Autor: | Abdelilah Slaoui, Laure Guétaz, H. Szambolics, J. Bartringer, S. Parola, Etienne Quesnel, Viviane Muffato |
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Přispěvatelé: | Jung, Marie-Anne, Institut d'Electronique du Solide et des Systèmes (InESS), Centre National de la Recherche Scientifique (CNRS), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA) |
Rok vydání: | 2012 |
Předmět: |
Materials science
Annealing (metallurgy) Bioengineering Nanotechnology General Chemistry Condensed Matter Physics Atomic and Molecular Physics and Optics Amorphous solid Surface coating symbols.namesake Chemical engineering Transmission electron microscopy Modeling and Simulation Physical vapor deposition symbols Energy filtered transmission electron microscopy General Materials Science Raman spectroscopy High-resolution transmission electron microscopy ComputingMilieux_MISCELLANEOUS |
Zdroj: | Journal of Nanoparticle Research Journal of Nanoparticle Research, 2012, 14, pp.1085_1-9 |
ISSN: | 1572-896X 1388-0764 |
DOI: | 10.1007/s11051-012-1085-0 |
Popis: | In this study, the synthesis of Ge nanoparticles by a physical vapour deposition (PVD) nanocluster source has been investigated. We typically obtain Ge nanoparticles with a mean diameter between 4 and 9 nm. The microstructure of Ge nanoparticles was widely studied by high resolution transmission electron microscopy, energy filtered transmission electron microscopy, X-ray diffraction and Raman spectroscopy. The main result is the capability of the PVD process to synthesize well crystallized Ge nanocrystals at room temperature and without any post thermal annealing. It was found from Raman analysis that these room temperature deposited nanoparticles are composed of a Ge crystalline core and a sub-nm thick amorphous Ge shell. A low temperature annealing (450 °C) during 1 h under vacuum leads to the reorganization of the surface atoms while longer annealing seems to promote the formation of a Ge oxide shell around the nanoparticles. |
Databáze: | OpenAIRE |
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