Lithography with a Focused Soft X-ray Beam and a Monomolecular Resist

Autor:	and Andreas Terfort, M. L. Huang, † Shih-Chieh Wang, Ruth Klauser, Tung Jung Chuang, Chia-Hao Chen, Michael Zharnikov
Rok vydání:	2004
Předmět:	Materials science Microscope business.industry Surfaces and Interfaces Microbeam Condensed Matter Physics law.invention Optics Resist law Monolayer Electrochemistry General Materials Science business Image resolution Lithography Spectroscopy Excitation Beam (structure)
Zdroj:	Langmuir. 20:2050-2053
ISSN:	1520-5827 0743-7463
DOI:	10.1021/la030398n
Popis:	A zone-plate-focused soft X-ray microbeam was utilized for direct patterning of a monomolecular resist: aliphatic and aromatic self-assembled monolayers. The fabricated patterns were subsequently imaged and characterized by a scanning photoelectron microscope (SPEM) using the same microbeam as the excitation source. The observed contrasts could be explained in terms of specific beam-resist interactions. The spatial resolution of the X-ray patterning was about 0.5 μm, which was mostly determined by the current SPEM settings and can be noticeably improved.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::99584c609f445dbdea51f67bbf973645 https://doi.org/10.1021/la030398n Zobrazit plný text záznamu