Exposure of AlN and Al2O3 to low energy D and He plasmas
| Autor: | R.P. Doerner, M. I. Patino, George Tynan |
|---|---|
| Rok vydání: | 2020 |
| Předmět: |
Nuclear and High Energy Physics
Materials science Materials Science (miscellaneous) Analytical chemistry chemistry.chemical_element Aluminum oxide Nitride Helium 01 natural sciences 010305 fluids & plasmas Low energy Aluminium 0103 physical sciences Ion energy Aluminum nitride 010302 applied physics Preferential sputtering Biasing Plasma Deuterium lcsh:TK9001-9401 Nuclear Energy and Engineering chemistry lcsh:Nuclear engineering. Atomic power |
| Zdroj: | Nuclear Materials and Energy, Vol 23, Iss, Pp-(2020) |
| ISSN: | 2352-1791 |
| DOI: | 10.1016/j.nme.2020.100753 |
| Popis: | Aluminum nitride (AlN) and aluminum oxide (Al2O3) were exposed to deuterium (D) and helium (He) plasma in the PISCES-A linear plasma device using RF biasing of the sample manipulator to set the incident ion energy (16–100 eV, 0.7–12 × 1025 m−2 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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